51猎奇入口

Skip to main content
Department Of Physics text logo
  • Research
    • Our research
    • Our research groups
    • Our research in action
    • Research funding support
    • Summer internships for undergraduates
  • 51猎奇入口
    • Undergraduates
    • Postgraduates
  • Engage
    • For young people
    • For teachers
    • For the public
    • For alumni
    • For business
  • Support
Menu
CMP
Credit: Jack Hobhouse

Robin Nicholas

Emeriti

Sub department

  • Condensed Matter Physics
Robin.Nicholas@physics.ox.ac.uk
Telephone: 01865 (2)72250
Clarendon Laboratory, room 053,151
  • About
  • Publications

High-field cyclotron resonance in the conduction bands of GaSb and effective-mass parameters at the L points

PHYSICAL REVIEW B 58:8 (1998) 4560-4565

Authors:

H Arimoto, N Miura, RJ Nicholas, NJ Mason, PJ Walker

Magnetic breakdown in the semimetallic InAs/GaSb system

PHYSICAL REVIEW B 58:11 (1998) 7292-7299

Authors:

DM Symons, M Lakrimi, RJ Nicholas, DK Maude, JC Portal, NJ Mason, PJ Walker

Searches for skyrmions in the limit of zero g-factor

SEMICONDUCTOR SCIENCE AND TECHNOLOGY 13:7 (1998) 671-679

Authors:

DR Leadley, RJ Nicholas, DK Maude, AN Utjuzh, JC Portal, JJ Harris, CT Foxon

Improved photoluminescence from electrochemically passivated GaSb

Semiconductor Science and Technology 12:4 (1997) 413-418

Authors:

A Salesse, R Alabedra, Y Chen, M Lakrimi, RJ Nicholas, NJ Mason, PJ Walker

Abstract:

A new class of insulating and passivating layers on gallium antimonide has been prepared by means of an electrochemical process. In previous work we used this new process of fabrication of passivating and insulating layers for gating devices made from GaSb/InAs/GaSb nanostructures (Chen Y et al 1994 Superlatt. Microstruct. 15 41 and Chen Y 1995 PhD Thesis Hertford College, Oxford, UK). In this publication we describe the effects of the electrochemical process leading to an improvement of the photoluminescence (PL) after the growth of the passivating layer on GaSb. The PL measurements on <100>, <111A> and <111B> GaSb substrates and on GaSb epilayers grown by MOVPE on GaAs indicate significant improvement of the PL intensity even after 12 months. Similar results have been observed on InGaSb/GaSb superlattice structures.

Growth of InAs/GaSb strained layer superlattices by MOVPE .3. Use of UV absorption to monitor alkyl stability in the reactor

J CRYST GROWTH 170:1-4 (1997) 777-782

Authors:

GR Booker, M Daly, PC Klipstein, M Lakrimi, TF Kuech, J Li, SG Lyapin, NJ Mason, IJ Murgatroyd, JC Portal, RJ Nicholas, DM Symons, P Vicente, PJ Walker

Abstract:

InAs/GaSb strained layer superlattices have been grown by atmospheric pressure MOVPE and the growth conditions optimised by observing, in real time, the in-situ UV absorption of the alkyls in the growth chamber. The Raman scattering of folded longitudinal acoustic phonons in the superlattices has been used as a probe of the periodicity of the superlattice. Atomic force microscopy has also been used to give information about the final surface morphology and RMS roughness of the superlattices. By combining all three techniques, optimum conditions have been found for the growth of short period InAs/GaSb superlattices. These have been used to sandwich a long period superlattice designed for transport measurements. The use of the short period superlattices eliminated additional conducting layers at each end of the semimetallic superlattice and produced structures where the hole and electron densities are equal. Such structures exhibit a dramatic new quantum transport effect where the Hall resistance goes to zero at high pressures and low temperatures.

Pagination

  • First page First
  • Previous page Prev
  • …
  • Page 44
  • Page 45
  • Page 46
  • Page 47
  • Current page 48
  • Page 49
  • Page 50
  • Page 51
  • Page 52
  • …
  • Next page Next
  • Last page Last

Footer Menu

  • Contact us
  • Giving to the Dept of Physics
  • Work with us
  • Media

User account menu

  • Log in

Follow us

FIND US

Clarendon Laboratory,

Parks Road,

Oxford,

OX1 3PU

CONTACT US

Tel: +44(0)1865272200

Department Of Physics text logo

漏 University of Oxford - Department of Physics

Cookies | Privacy policy | Accessibility statement

  • Home
  • Research
  • 51猎奇入口
  • Engage
  • Our people
  • News & Comment
  • Events
  • Our facilities & services
  • 51猎奇入口
  • Giving to Physics