Abnormal photoluminescence properties of GaN nanorods grown on Si(111) by molecular-beam epitaxy
NANOTECHNOLOGY 19:47 (2008) ARTN 475402
Electrically driven single InGaN/GaN quantum dot emission
APPLIED PHYSICS LETTERS 93:23 (2008) ARTN 233103
Fabrication of Ultrathin Single-Crystal Diamond Membranes
ADVANCED MATERIALS 20:24 (2008) 4793-+
Properties of selective-area-growth GaN grown on various buffered Si(111) substrates by HVPE
J KOREAN PHYS SOC 51 (2007) S220-S224
Abstract:
Selective area growth (SAG) of GaN by hydride vapor phase epitaxy (HVPE) has been performed on SiO2 stripe-mask-patterned Si(111) substrates with various buffer layers. AlGaN, GaN and AIN films were used as buffer layers. In order to grow selectively, the orientation of the SiO2 mask pattern was opened along the Si (110) direction. The properties of the SAG-GaN samples were investigated by scanning electron microscopy (SEM), X-ray diffraction (XRD), and photoluminescence(PL). SEM images show that hexagonal SAG-GaN grows vertically along the < 0001 > direction, longitudinally along the < 11 (2) over bar0 > direction with facets on the sidewall growing along the (1 (1) over bar 01) direction. It was found that the lateral-to-vertical growth ratio depended strongly on different buffer layers.Configuration-selective spectroscopic studies of Er3+ centers in ErSc2N@C80 and Er2ScN@C80 fullerenes.
J Chem Phys 127:19 (2007) 194504